Publication:

A novel method for characterizing resist performance

Date

2008
Journal article
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dc.contributor.authorVan Steenwinckel, David
dc.contributor.authorGronheid, Roel
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorWillems, Patrick
dc.contributor.authorLammers, Jeroen H.
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorWillems, Patrick
dc.date.accessioned2021-10-17T12:03:31Z
dc.date.available2021-10-17T12:03:31Z
dc.date.embargo9999-12-31
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14681
dc.source.beginpage23002
dc.source.issue2
dc.source.journalJournal of Micro/Nanolithography, MEMS, and MOEMS
dc.source.volume7
dc.title

A novel method for characterizing resist performance

dc.typeJournal article
dspace.entity.typePublication
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