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Channel engineering and junction overlap issues for ultra-shallow junctions formed by SPER in the 45 nm CMOS technology node
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Channel engineering and junction overlap issues for ultra-shallow junctions formed by SPER in the 45 nm CMOS technology node
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Date
2004
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Severi, Simone
;
Henson, Kirklen
;
Lindsay, Richard
;
Lauwers, Anne
;
Pawlak, Bartek
;
Surdeanu, Radu
;
De Meyer, Kristin
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1922
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Acq. date: 2026-08-06
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Views
1922
since deposited on 2021-10-15
1
last month
1
last week
Acq. date: 2026-08-06
Citations