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Channel engineering and junction overlap issues for ultra-shallow junctions formed by SPER in the 45 nm CMOS technology node
Publication:
Channel engineering and junction overlap issues for ultra-shallow junctions formed by SPER in the 45 nm CMOS technology node
Date
2004-04
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Severi, Simone
;
Henson, Kirklen
;
Lindsay, Richard
;
Lauwers, Anne
;
Pawlak, Bartek
;
Surdeanu, Radu
;
De Meyer, Kristin
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1910
since deposited on 2021-10-15
Acq. date: 2025-10-22
Citations
Metrics
Views
1910
since deposited on 2021-10-15
Acq. date: 2025-10-22
Citations