Publication:
Channel engineering and junction overlap issues for ultra-shallow junctions formed by SPER in the 45 nm CMOS technology node
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1920 since deposited on 2021-10-15
5last month
Acq. date: 2026-03-17
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Statistics
Views
1920 since deposited on 2021-10-15
5last month
Acq. date: 2026-03-17
Citations