Publication:

Role of landing energy in e-beam metrology of thin photoresist for high-numerical aperture extreme ultraviolet lithography

Date

2023
Journal article
https://doi.org/10.1117/1.jmm.22.2.021002
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Published version 2.27 MB
Accepted version 1001.33 KB

Author(s)

Zidan, Mohamed  
;
Fischer, Daniel
;
Severi, Joren  
;
De Simone, Danilo  
;
Moussa, Alain  
;
Mullender, Angelika
;
Mack, Chris
;
Charley, Anne-Laure  
;
Leray, Philippe  
;
De Gendt, Stefan  
;
Lorusso, Gian  

Journal

JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3

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