Publication:

Role of landing energy in e-beam metrology of thin photoresist for high-numerical aperture extreme ultraviolet lithography

Date

2023
Journal article
https://doi.org/10.1117/1.JMM.22.2.021002
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dc.contributor.authorZidan, Mohamed
dc.contributor.authorFischer, Daniel
dc.contributor.authorSeveri, Joren
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorMoussa, Alain
dc.contributor.authorMullender, Angelika
dc.contributor.authorMack, Chris
dc.contributor.authorCharley, Anne-Laure
dc.contributor.authorLeray, Philippe
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorLorusso, Gian
dc.contributor.imecauthorZidan, Mohamed
dc.contributor.imecauthorSeveri, Joren
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorMoussa, Alain
dc.contributor.imecauthorCharley, Anne-Laure
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorLorusso, Gian
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecMoussa, Alain::0000-0002-6377-4199
dc.contributor.orcidimecCharley, Anne-Laure::0000-0003-4745-0167
dc.contributor.orcidimecLeray, Philippe::0000-0002-1086-270X
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecLorusso, Gian::0000-0003-3498-5082
dc.date.accessioned2024-01-22T15:29:06Z
dc.date.available2024-01-08T17:19:01Z
dc.date.available2024-01-22T15:29:06Z
dc.date.embargo2023-06-10
dc.date.issued2023
dc.description.wosFundingTextThis work was executed as part of imec's core partner program. Joren Severi received funding from Fonds Wetenschappelijk Onderzoek (FWO; 1SA8919N). This manuscript has been previously published in the SPIE Conference Proceedings Volume 12053, Metrology, Inspection, and Process Control XXXVI; 120530P (2022) https://doi.org/10.1117/12.2613990.11
dc.identifier.doi10.1117/1.JMM.22.2.021002
dc.identifier.issn1932-5150
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/43360
dc.publisherSPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS
dc.source.beginpage021002
dc.source.endpageNA
dc.source.issue2
dc.source.journalJOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
dc.source.numberofpages12
dc.source.volume22
dc.title

Role of landing energy in e-beam metrology of thin photoresist for high-numerical aperture extreme ultraviolet lithography

dc.typeJournal article
dspace.entity.typePublication
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