Publication:

Ni-based silicides for 45 nm CMOS and beyond

Date

2004
Journal article
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dc.contributor.authorLauwers, Anne
dc.contributor.authorKittl, Jorge
dc.contributor.authorVan Dal, Mark
dc.contributor.authorChamirian, Oxana
dc.contributor.authorKmieciak, Malgorzata
dc.contributor.authorde Potter de ten Broeck, Muriel
dc.contributor.authorLindsay, Richard
dc.contributor.authorRaymakers, Toon
dc.contributor.authorPagès, Xavier
dc.contributor.authorMebarki, Bencherki
dc.contributor.authorMandrekar, Tushar
dc.contributor.authorMaex, Karen
dc.contributor.imecauthorLauwers, Anne
dc.contributor.imecauthorVan Dal, Mark
dc.contributor.imecauthorde Potter de ten Broeck, Muriel
dc.contributor.imecauthorMaex, Karen
dc.date.accessioned2021-10-15T14:23:01Z
dc.date.available2021-10-15T14:23:01Z
dc.date.embargo9999-12-31
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9182
dc.source.beginpage29
dc.source.endpage41
dc.source.journalMaterials Science and Engineering B
dc.source.volume114-115
dc.title

Ni-based silicides for 45 nm CMOS and beyond

dc.typeJournal article
dspace.entity.typePublication
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