Publication:

Scalpel Soft Retrace Scanning Spreading Resistance microscopy for 3D-carrier profiling in sub 10-nm WFIN FinFETs

Date

2015
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorEyben, Pierre
dc.contributor.authorChiarella, Thomas
dc.contributor.authorKubicek, Stefan
dc.contributor.authorBender, Hugo
dc.contributor.authorRichard, Olivier
dc.contributor.authorMitard, Jerome
dc.contributor.authorMocuta, Anda
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorThean, Aaron
dc.contributor.imecauthorEyben, Pierre
dc.contributor.imecauthorChiarella, Thomas
dc.contributor.imecauthorKubicek, Stefan
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorMitard, Jerome
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorThean, Aaron
dc.contributor.orcidimecChiarella, Thomas::0000-0002-6155-9030
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecMitard, Jerome::0000-0002-7422-079X
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.date.accessioned2021-10-22T19:12:47Z
dc.date.available2021-10-22T19:12:47Z
dc.date.embargo9999-12-31
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25260
dc.source.beginpage350
dc.source.conferenceIEEE International Electron Devices Meeting - IEDM
dc.source.conferencedate7/12/2015
dc.source.conferencelocationWashington, D.C. USA
dc.source.endpage353
dc.title

Scalpel Soft Retrace Scanning Spreading Resistance microscopy for 3D-carrier profiling in sub 10-nm WFIN FinFETs

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
32492.pdf
Size:
2.84 MB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions