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Dielectric quality and reliability of FUSI/HfSiON devices with process induced strain
Publication:
Dielectric quality and reliability of FUSI/HfSiON devices with process induced strain
Date
2007
Journal article
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Shickova, Adelina
;
Kaczer, Ben
;
Simoen, Eddy
;
Verheyen, Peter
;
Eneman, Geert
;
Jurczak, Gosia
;
Absil, Philippe
;
Maes, Herman
;
Groeseneken, Guido
Journal
Microelectronic Engineering
Abstract
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1930
since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations
Metrics
Views
1930
since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations