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Modelling and microstructural characterisation of incubation, time-dependent drift and saturation during electromigration in Al-Si-Cu stripes
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Modelling and microstructural characterisation of incubation, time-dependent drift and saturation during electromigration in Al-Si-Cu stripes
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Date
1999
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Witvrouw, Ann
;
Bender, Hugo
;
Roussel, Philippe
;
Maex, Karen
Journal
Microelectronics and Reliability
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1823
since deposited on 2021-10-14
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Acq. date: 2025-12-15
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Metrics
Views
1823
since deposited on 2021-10-14
2
last month
1
last week
Acq. date: 2025-12-15
Citations