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Compatibility between polymethacrylate-based extreme ultraviolet resists and TiO(2 )area-selective deposition
Publication:
Compatibility between polymethacrylate-based extreme ultraviolet resists and TiO(2 )area-selective deposition
Date
2022
Journal article
https://doi.org/10.1117/1.JMM.21.4.041407
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2.98 MB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Nye, Rachel
;
Van Dongen, Kaat
;
Oka, Hironori
;
De Simone, Danilo
;
Parsons, Gregory N. N.
;
Delabie, Annelies
Journal
JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
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318
since deposited on 2023-03-01
11
item.page.metrics.field.last-week
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1400
since deposited on 2023-03-01
1
item.page.metrics.field.last-week
Acq. date: 2025-10-28
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