Publication:

Compatibility between polymethacrylate-based extreme ultraviolet resists and TiO(2 )area-selective deposition

Date

2022
Journal article
https://doi.org/10.1117/1.JMM.21.4.041407
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dc.contributor.authorNye, Rachel
dc.contributor.authorVan Dongen, Kaat
dc.contributor.authorOka, Hironori
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorParsons, Gregory N. N.
dc.contributor.authorDelabie, Annelies
dc.contributor.imecauthorNye, Rachel
dc.contributor.imecauthorVan Dongen, Kaat
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecDelabie, Annelies::0000-0001-9739-7419
dc.date.accessioned2023-04-06T14:20:08Z
dc.date.available2023-03-01T03:27:56Z
dc.date.available2023-04-06T14:20:08Z
dc.date.embargo2022-11-04
dc.date.issued2022
dc.identifier.doi10.1117/1.JMM.21.4.041407
dc.identifier.issn1932-5150
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/41209
dc.publisherSPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS
dc.source.beginpageArt. 041407
dc.source.endpagena
dc.source.issue4
dc.source.journalJOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
dc.source.numberofpages14
dc.source.volume21
dc.subject.keywordsATOMIC LAYER DEPOSITION
dc.subject.keywordsAREA-SELECTIVE DEPOSITION
dc.subject.keywordsGROWTH
dc.title

Compatibility between polymethacrylate-based extreme ultraviolet resists and TiO(2 )area-selective deposition

dc.typeJournal article
dspace.entity.typePublication
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