Publication:

Advanced carrier depth profiling on Si and Ge with M4PP

Date

2007
Proceedings Paper
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dc.contributor.authorClarysse, Trudo
dc.contributor.authorEyben, Pierre
dc.contributor.authorParmentier, Brigitte
dc.contributor.authorVan Daele, Benny
dc.contributor.authorSatta, Alessandra
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorLin, Rong
dc.contributor.authorPetersen, Dirch
dc.contributor.authorFolmer Nielsen, Peter
dc.contributor.imecauthorEyben, Pierre
dc.contributor.imecauthorParmentier, Brigitte
dc.contributor.imecauthorVandervorst, Wilfried
dc.date.accessioned2021-10-16T15:20:43Z
dc.date.available2021-10-16T15:20:43Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11884
dc.source.conferenceInternational Workshop on INSIGHT in Semiconductor Device Fabrication, Metrology and Modeling
dc.source.conferencedate6/05/2007
dc.source.conferencelocationNapa, CA USA
dc.title

Advanced carrier depth profiling on Si and Ge with M4PP

dc.typeProceedings paper
dspace.entity.typePublication
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