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Seed-less copper electrochemical deposition on PVD resistive substrates as a replacement/enhancement for PVD Cu seed layers in HAR TSVs
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Seed-less copper electrochemical deposition on PVD resistive substrates as a replacement/enhancement for PVD Cu seed layers in HAR TSVs
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Date
2010
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Armini, Silvia
;
Wilson, Chris
;
Moussa, Alain
;
Franquet, Alexis
;
Vanstreels, Kris
;
Atanasova, Tanya
;
Radisic, Alex
;
Civale, Yann
;
Redolfi, Augusto
;
Van Ammel, Annemie
;
El-Mekki, Zaid
;
Bryce, George
;
Ruythooren, Wouter
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1914
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Acq. date: 2025-12-16
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Metrics
Views
1914
since deposited on 2021-10-18
1
last month
Acq. date: 2025-12-16
Citations