Publication:

Challenges in setting up the patterning processes for a 16nm node SRAM cell

Date

2010
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dc.contributor.authorErcken, Monique
dc.contributor.authorVandeweyer, Tom
dc.contributor.authorVersluijs, Janko
dc.contributor.authorTruffert, Vincent
dc.contributor.authorDe Backer, Johan
dc.contributor.authorDelvaux, Christie
dc.contributor.authorBaerts, Christina
dc.contributor.imecauthorErcken, Monique
dc.contributor.imecauthorVandeweyer, Tom
dc.contributor.imecauthorVersluijs, Janko
dc.contributor.imecauthorTruffert, Vincent
dc.contributor.imecauthorDe Backer, Johan
dc.contributor.imecauthorDelvaux, Christie
dc.contributor.imecauthorBaerts, Christina
dc.contributor.orcidimecTruffert, Vincent::0000-0001-7851-830X
dc.date.accessioned2021-10-18T16:15:36Z
dc.date.available2021-10-18T16:15:36Z
dc.date.embargo9999-12-31
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17079
dc.source.conferenceFujifilm Advanced Lithography Workshop
dc.source.conferencedate16/09/2010
dc.source.conferencelocationDresden Germany
dc.title

Challenges in setting up the patterning processes for a 16nm node SRAM cell

dc.typeOral presentation
dspace.entity.typePublication
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