Publication:

TOF-SIMS as a rapid diagnostic tool to monitor the growth mode of thin (high k) films

Date

2003
Journal article
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dc.contributor.authorConard, Thierry
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorPetry, Jasmine
dc.contributor.authorZhao, Chao
dc.contributor.authorBesling, W.
dc.contributor.authorNohira, Hiroshi
dc.contributor.authorRichard, Olivier
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorRichard, Olivier
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.date.accessioned2021-10-15T04:11:28Z
dc.date.available2021-10-15T04:11:28Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7343
dc.source.beginpage400
dc.source.endpage403
dc.source.journalApplied Surface Science
dc.source.volume203-204
dc.title

TOF-SIMS as a rapid diagnostic tool to monitor the growth mode of thin (high k) films

dc.typeJournal article
dspace.entity.typePublication
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