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Improving OPC Model Accuracy of Dry Resist for Low k1 EUV Patterning
Publication:
Improving OPC Model Accuracy of Dry Resist for Low k1 EUV Patterning
Date
2024
Proceedings Paper
https://doi.org/10.1117/12.3010127
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Xu, Dongbo
;
Gillijns, Werner
;
Wu, Stewart
;
Jambaldinni, Shruti
;
Kam, Benjamin
;
De Silva, Anuja
;
Fenger, Germain
Journal
Proceedings of SPIE
Abstract
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647
since deposited on 2024-06-15
Acq. date: 2025-10-23
Views
639
since deposited on 2024-06-15
Acq. date: 2025-10-23
Citations
Metrics
Downloads
647
since deposited on 2024-06-15
Acq. date: 2025-10-23
Views
639
since deposited on 2024-06-15
Acq. date: 2025-10-23
Citations