Publication:

Improving OPC Model Accuracy of Dry Resist for Low k1 EUV Patterning

Date

2024
Proceedings Paper
https://doi.org/10.1117/12.3010127
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Published version 10.5 MB

Author(s)

Xu, Dongbo
;
Gillijns, Werner  
;
Wu, Stewart
;
Jambaldinni, Shruti
;
Kam, Benjamin
;
De Silva, Anuja
;
Fenger, Germain

Journal

Proceedings of SPIE

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698 since deposited on 2024-06-15
Acq. date: 2026-06-21

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647 since deposited on 2024-06-15
Acq. date: 2026-06-21

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