Improving OPC Model Accuracy of Dry Resist for Low k1 EUV Patterning

dc.contributor.author	Xu, Dongbo
dc.contributor.author	Gillijns, Werner
dc.contributor.author	Wu, Stewart
dc.contributor.author	Jambaldinni, Shruti
dc.contributor.author	Kam, Benjamin
dc.contributor.author	De Silva, Anuja
dc.contributor.author	Fenger, Germain
dc.contributor.imecauthor	Gillijns, Werner
dc.contributor.orcidimec	Gillijns, Werner::0000-0002-2430-7360
dc.date.accessioned	2024-08-26T08:29:32Z
dc.date.available	2024-06-15T17:25:04Z
dc.date.available	2024-08-26T08:29:32Z
dc.date.embargo	2024-04-10
dc.date.issued	2024
dc.identifier.doi	10.1117/12.3010127
dc.identifier.eisbn	978-1-5106-7215-4
dc.identifier.isbn	978-1-5106-7214-7
dc.identifier.issn	0277-786X
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/44037
dc.publisher	SPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage	Art. 129540L
dc.source.conference	Conference on DTCO and Computational Patterning III
dc.source.conferencedate	FEB 26-29, 2024
dc.source.conferencelocation	San Jose
dc.source.journal	Proceedings of SPIE
dc.source.numberofpages	9
dc.source.volume	12954
dc.title	Improving OPC Model Accuracy of Dry Resist for Low k1 EUV Patterning
dc.type	Proceedings paper
dspace.entity.type	Publication
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