In-line metrology for characterization and control of extreme wafer thinning of bonded wafers

Liebens, Maarten; Jourdain, Anne; De Vos, Joeri; Vandeweyer, Tom; Miller, Andy; Beyne, Eric; Li, Shifang; Bast, Gerard; Stoerring, Moritz; Hiebert, Stephen; Cross, Andrew

Publication:

In-line metrology for characterization and control of extreme wafer thinning of bonded wafers

Date

2019

Journal article

Simple item page Full metadata Statistics

Files

39664.pdf 1.81 MB

Author(s)

;

;

;

;

;

;

;

;

;

;

Journal

IEEE Transactions on Semiconductor Manufacturing

Metrics

1920 since deposited on 2021-10-27

2last month

Acq. date: 2026-01-07

In-line metrology for characterization and control of extreme wafer thinning of bonded wafers

Date

Files

Author(s)

Journal

Abstract

Description

Metrics

Views

Citations

Metrics

Views

Citations