Skip to content
Institutional repository
Communities & Collections
Browse all items
Scientific publications
Open knowledge
Log In
imec Publications
Articles
In-line metrology for characterization and control of extreme wafer thinning of bonded wafers
Publication:
In-line metrology for characterization and control of extreme wafer thinning of bonded wafers
Copy permalink
Date
2019
Journal article
Simple item page
Full metadata
Statistics
Loading...
Loading...
Files
39664.pdf
1.81 MB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Liebens, Maarten
;
Jourdain, Anne
;
De Vos, Joeri
;
Vandeweyer, Tom
;
Miller, Andy
;
Beyne, Eric
;
Li, Shifang
;
Bast, Gerard
;
Stoerring, Moritz
;
Hiebert, Stephen
;
Cross, Andrew
Journal
IEEE Transactions on Semiconductor Manufacturing
Abstract
Description
Metrics
Views
1919
since deposited on 2021-10-27
1
last month
1
last week
Acq. date: 2025-12-12
Citations
Metrics
Views
1919
since deposited on 2021-10-27
1
last month
1
last week
Acq. date: 2025-12-12
Citations