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Spacer self aligned double patterning: process control
Publication:
Spacer self aligned double patterning: process control
Date
2009
Presentation
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Vandeweyer, Tom
;
Altamirano Sanchez, Efrain
;
Vangoidsenhoven, Diziana
;
Murdoch, Gayle
;
Groenendijk, Remco
;
Hepp, Birgitt
;
Mos, Evert
;
Finders, Jo
;
Vleeming, Bert
;
Dusa, Mircea
;
Maenhoudt, Mireille
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1907
since deposited on 2021-10-18
Acq. date: 2025-10-23
Citations
Metrics
Views
1907
since deposited on 2021-10-18
Acq. date: 2025-10-23
Citations