Publication:

Spacer self aligned double patterning: process control

Date

2009
Presentation
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dc.contributor.authorVandeweyer, Tom
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorVangoidsenhoven, Diziana
dc.contributor.authorMurdoch, Gayle
dc.contributor.authorGroenendijk, Remco
dc.contributor.authorHepp, Birgitt
dc.contributor.authorMos, Evert
dc.contributor.authorFinders, Jo
dc.contributor.authorVleeming, Bert
dc.contributor.authorDusa, Mircea
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.imecauthorVandeweyer, Tom
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorVangoidsenhoven, Diziana
dc.contributor.imecauthorMurdoch, Gayle
dc.contributor.imecauthorDusa, Mircea
dc.date.accessioned2021-10-18T04:29:51Z
dc.date.available2021-10-18T04:29:51Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16435
dc.source.conference10th ASML Technology Conference
dc.source.conferencedate24/06/2009
dc.source.conferencelocationVeldhoven Nederland
dc.title

Spacer self aligned double patterning: process control

dc.typeOral presentation
dspace.entity.typePublication
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