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Influence of CH4/H2 reactive ion etching on electrical and optical properties of AlGaAs/GaAs and pseudomorphic AlGaAs/InGaAs/GaAs heterostructures
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Influence of CH4/H2 reactive ion etching on electrical and optical properties of AlGaAs/GaAs and pseudomorphic AlGaAs/InGaAs/GaAs heterostructures
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Date
1995
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
van Es, C. M.
;
Eijkemans, T. J.
;
Wolter, J. H.
;
Pereira, Ricardo
;
Van Hove, Marleen
;
Van Rossum, Marc
Journal
Materials Science and Technology
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1946
since deposited on 2021-09-29
Acq. date: 2026-01-10
Citations
Metrics
Views
1946
since deposited on 2021-09-29
Acq. date: 2026-01-10
Citations