Skip to content
Institutional repository
Communities & Collections
Browse all items
Scientific publications
Open knowledge
Log In
imec Publications
Articles
Ultrathin EOT high-k/metal gate devices for future technologies: challenges, achievements and perspectives
Publication:
Ultrathin EOT high-k/metal gate devices for future technologies: challenges, achievements and perspectives
Copy permalink
Date
2011
Journal article
Simple item page
Full metadata
Statistics
Loading...
Loading...
Files
22314.pdf
931.04 KB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Ragnarsson, Lars-Ake
;
Chiarella, Thomas
;
Togo, Mitsuhiro
;
Schram, Tom
;
Absil, Philippe
;
Hoffmann, Thomas Y.
Journal
Microelectronic Engineering
Abstract
Description
Metrics
Views
1898
since deposited on 2021-10-19
1
last month
1
last week
Acq. date: 2025-12-16
Citations
Metrics
Views
1898
since deposited on 2021-10-19
1
last month
1
last week
Acq. date: 2025-12-16
Citations