Publication:

EUV processing investigation on state-of-the-art coater/developer system

Date

2011
Proceedings Paper
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dc.contributor.authorShite, Hideo
dc.contributor.authorBradon, Neil
dc.contributor.authorShimoaoki, T.
dc.contributor.authorKobayashi, S.
dc.contributor.authorNafus, Kathleen
dc.contributor.authorKosugi, Hitoshi
dc.contributor.authorFoubert, Philippe
dc.contributor.authorHermans, Jan
dc.contributor.authorHendrickx, Eric
dc.contributor.authorGoethals, Mieke
dc.contributor.authorGronheid, Roel
dc.contributor.authorJehoul, Christiane
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorHermans, Jan
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorJehoul, Christiane
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.date.accessioned2021-10-19T18:45:48Z
dc.date.available2021-10-19T18:45:48Z
dc.date.embargo9999-12-31
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19773
dc.source.beginpage796937
dc.source.conferenceExtreme Ultravoiolet (EUV) Lithography II
dc.source.conferencedate27/02/2011
dc.source.conferencelocationSan Jose, CA USA
dc.title

EUV processing investigation on state-of-the-art coater/developer system

dc.typeProceedings paper
dspace.entity.typePublication
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