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The application of an ultra-thin ALD HfSiON cap layer on SiON dielectrics for Ni-FUSI CMOS technology targeting at low power applications
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1920 since deposited on 2021-10-16
2last month
Acq. date: 2025-12-10
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1920 since deposited on 2021-10-16
2last month
Acq. date: 2025-12-10
Citations