Publication:
Stress Reduction in Tungsten CVD Films by RTA Post-Treatment of Ti/TiN Bilayers in Ammonia
Date
| dc.contributor.author | Palmans, Roger | |
| dc.contributor.author | Mouroux, Aliette | |
| dc.contributor.author | Zhang, S. L. | |
| dc.contributor.author | Petersson, S. | |
| dc.contributor.author | Maex, Karen | |
| dc.contributor.imecauthor | Maex, Karen | |
| dc.date.accessioned | 2021-09-29T13:15:38Z | |
| dc.date.available | 2021-09-29T13:15:38Z | |
| dc.date.issued | 1995 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/811 | |
| dc.source.conference | Conference on Advanced Metallization and Interconnect Systems for ULSI Applications; October 3-5, 1995; Portland, Oregon, USA. | |
| dc.source.conferencelocation | ||
| dc.title | Stress Reduction in Tungsten CVD Films by RTA Post-Treatment of Ti/TiN Bilayers in Ammonia | |
| dc.type | Oral presentation | |
| dspace.entity.type | Publication | |
| Files | ||
| Publication available in collections: |