Publication:

Characterization of patterned porous low-k dielectrics: surface sealing and residue removal by wet processing/cleaning

Date

2016
Journal article
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dc.contributor.authorLe, Quoc Toan
dc.contributor.authorKesters, Els
dc.contributor.authorDecoster, Stefan
dc.contributor.authorChan, BT
dc.contributor.authorNguyen, Mai Phuong
dc.contributor.authorConard, Thierry
dc.contributor.authorVanleenhove, Anja
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorDe Gendt, Stefan
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorDecoster, Stefan
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorVanleenhove, Anja
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.contributor.orcidimecDecoster, Stefan::0000-0003-1162-9288
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-23T12:03:57Z
dc.date.available2021-10-23T12:03:57Z
dc.date.issued2016
dc.identifier.issn2162-8769
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26880
dc.identifier.urlhttp://jss.ecsdl.org/content/5/3/N5.short
dc.source.beginpageN5
dc.source.endpageN9
dc.source.issue3
dc.source.journalECS Journal of Solid State Science and Technology
dc.source.volume5
dc.title

Characterization of patterned porous low-k dielectrics: surface sealing and residue removal by wet processing/cleaning

dc.typeJournal article
dspace.entity.typePublication
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