Measurement and simulation of boron diffusivity in strained Si1-XGex epitaxial layers

dc.contributor.author	Krishnasamy, Rajendran
dc.contributor.author	Schoenmaker, Wim
dc.date.accessioned	2021-10-14T17:39:33Z
dc.date.available	2021-10-14T17:39:33Z
dc.date.embargo	9999-12-31
dc.date.issued	2001
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/5597
dc.source.beginpage	317
dc.source.endpage	321
dc.source.issue	1_4
dc.source.journal	VLSI Design
dc.source.volume	13
dc.title	Measurement and simulation of boron diffusivity in strained Si1-XGex epitaxial layers
dc.type	Journal article
dspace.entity.type	Publication
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