Publication:

Atomic layer deposition of Hf-based materials in semiconductor applications

Date

2008
Meeting abstract
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dc.contributor.authorNyns, Laura
dc.contributor.authorDelabie, Annelies
dc.contributor.authorHeyns, Marc
dc.contributor.authorPourtois, Geoffrey
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorVinckier, Chris
dc.contributor.authorDe Gendt, Stefan
dc.contributor.imecauthorNyns, Laura
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorPourtois, Geoffrey
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecNyns, Laura::0000-0001-8220-870X
dc.contributor.orcidimecPourtois, Geoffrey::0000-0003-2597-8534
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-17T09:22:48Z
dc.date.available2021-10-17T09:22:48Z
dc.date.embargo9999-12-31
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14231
dc.source.beginpage1915
dc.source.conference214th ECS Meeting
dc.source.conferencedate12/10/2008
dc.source.conferencelocationHonolulu, HI USA
dc.title

Atomic layer deposition of Hf-based materials in semiconductor applications

dc.typeMeeting abstract
dspace.entity.typePublication
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