Skip to content
Institutional repository
Communities & Collections
Browse all items
Scientific publications
Open knowledge
Log In
imec Publications
Conference contributions
PFAS-free EUV rinse for advanced technology nodes
Publication:
PFAS-free EUV rinse for advanced technology nodes
Copy permalink
Date
2024
Proceedings Paper
https://doi.org/10.1117/12.3034706
Simple item page
Full metadata
Statistics
Loading...
Loading...
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Fallica, Roberto
;
Heo, Seonggil
;
Suh, Hyo Seon
;
De Simone, Danilo
Journal
Proceedings of SPIE
Abstract
Description
Metrics
Views
130
since deposited on 2025-05-11
Acq. date: 2025-12-15
Citations
Metrics
Views
130
since deposited on 2025-05-11
Acq. date: 2025-12-15
Citations