Publication:

PFAS-free EUV rinse for advanced technology nodes

Date

2024
Proceedings Paper
https://doi.org/10.1117/12.3034706
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dc.contributor.authorFallica, Roberto
dc.contributor.authorHeo, Seonggil
dc.contributor.authorSuh, Hyo Seon
dc.contributor.authorDe Simone, Danilo
dc.contributor.imecauthorFallica, Roberto
dc.contributor.imecauthorHeo, Seonggil
dc.contributor.imecauthorSuh, Hyo Seon
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.orcidimecFallica, Roberto::0000-0003-4523-9624
dc.contributor.orcidimecHeo, Seonggil::0009-0007-1447-7183
dc.contributor.orcidimecSuh, Hyo Seon::0000-0003-4370-5062
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.date.accessioned2025-07-07T08:43:44Z
dc.date.available2025-05-11T05:43:39Z
dc.date.available2025-07-07T08:43:44Z
dc.date.issued2024
dc.identifier.doi10.1117/12.3034706
dc.identifier.eisbn978-1-5106-8156-9
dc.identifier.isbn978-1-5106-8155-2
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/45643
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpageArt. 132150L
dc.source.conference2024 International Conference on Extreme Ultraviolet Lithography
dc.source.conferencedateSEP 30-OCT 03, 2024
dc.source.conferencelocationMonterey
dc.source.endpageN/A
dc.source.journalProceedings of SPIE
dc.source.numberofpages5
dc.source.volume13215
dc.title

PFAS-free EUV rinse for advanced technology nodes

dc.typeProceedings paper
dspace.entity.typePublication
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