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H2O- and O3-based atomic layer deposition of high-K dielectric films on GeO2 passivation layers
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H2O- and O3-based atomic layer deposition of high-K dielectric films on GeO2 passivation layers
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Date
2009
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Delabie, Annelies
;
Alian, AliReza
;
Bellenger, Florence
;
Caymax, Matty
;
Conard, Thierry
;
Franquet, Alexis
;
Sioncke, Sonja
;
Van Elshocht, Sven
;
Heyns, Marc
;
Meuris, Marc
Journal
Journal of the Electrochemical Society
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2021
since deposited on 2021-10-17
Acq. date: 2025-12-10
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Views
2021
since deposited on 2021-10-17
Acq. date: 2025-12-10
Citations