Publication:
Extreme silicon thinning for back side power delivery network: Si thinning stopping on scaled SiGe etch stop layer
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.orcid | 0000-0002-7610-0513 | |
| cris.virtual.orcid | 0000-0002-3096-050X | |
| cris.virtual.orcid | 0000-0003-3235-6055 | |
| cris.virtual.orcid | 0009-0008-0186-6101 | |
| cris.virtual.orcid | 0000-0003-3513-6058 | |
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| cris.virtualsource.orcid | f9201c37-3f0a-41df-8f08-14b5ee023fab | |
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| cris.virtualsource.orcid | 2d7dd015-fa43-4fbb-89fc-68f144075506 | |
| dc.contributor.author | Sebaai, Farid | |
| dc.contributor.author | Loo, Roger | |
| dc.contributor.author | Jourdain, Anne | |
| dc.contributor.author | Beyne, Eric | |
| dc.contributor.author | Kawarazaki, Hikaru | |
| dc.contributor.author | Teppei, Nakano | |
| dc.contributor.author | Altamirano Sanchez, Efrain | |
| dc.contributor.imecauthor | Sebaai, Farid | |
| dc.contributor.imecauthor | Loo, Roger | |
| dc.contributor.imecauthor | Jourdain, Anne | |
| dc.contributor.imecauthor | Beyne, Eric | |
| dc.contributor.imecauthor | Altamirano Sanchez, Efrain | |
| dc.contributor.orcidimec | Sebaai, Farid::0009-0008-0186-6101 | |
| dc.contributor.orcidimec | Loo, Roger::0000-0003-3513-6058 | |
| dc.contributor.orcidimec | Jourdain, Anne::0000-0002-7610-0513 | |
| dc.contributor.orcidimec | Beyne, Eric::0000-0002-3096-050X | |
| dc.contributor.orcidimec | Altamirano Sanchez, Efrain::0000-0003-3235-6055 | |
| dc.date.accessioned | 2025-06-19T12:43:44Z | |
| dc.date.available | 2024-08-07T19:37:37Z | |
| dc.date.available | 2025-06-19T12:43:44Z | |
| dc.date.issued | 2024 | |
| dc.description.wosFundingText | Farid Sebaai reports equipment, drugs, or supplies was provided by IMEC and Screen Semiconductor Solutions Co., Ltd. If there are other authors, they declare that they have no known competing financial in-terests or personal relationships that could have appeared to influence the work reported in this paper. | |
| dc.identifier.doi | 10.1016/j.mee.2024.112246 | |
| dc.identifier.issn | 0167-9317 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/44274 | |
| dc.publisher | ELSEVIER | |
| dc.source.beginpage | Art. 112246 | |
| dc.source.endpage | N/A | |
| dc.source.issue | 15 November | |
| dc.source.journal | MICROELECTRONIC ENGINEERING | |
| dc.source.numberofpages | 6 | |
| dc.source.volume | 294 | |
| dc.title | Extreme silicon thinning for back side power delivery network: Si thinning stopping on scaled SiGe etch stop layer | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
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