Publication:

Hyper NA EUV lithography: an imaging perspective

Date

2023
Journal article
https://doi.org/10.1117/1.JMM.22.4.043202
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dc.contributor.authorLee, Inhwan
dc.contributor.authorFranke, Joern-Holger
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorRonse, Kurt
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHendrickx, Eric
dc.contributor.imecauthorLee, Inhwan
dc.contributor.imecauthorFranke, Joern-Holger
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.orcidimecLee, Inhwan::0000-0002-3283-5075
dc.contributor.orcidimecFranke, Joern-Holger::0000-0002-3571-1633
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecHendrickx, Eric::0000-0003-2516-0417
dc.date.accessioned2024-03-25T10:17:42Z
dc.date.available2024-02-27T17:42:53Z
dc.date.available2024-03-25T10:17:42Z
dc.date.issued2023
dc.identifier.doi10.1117/1.JMM.22.4.043202
dc.identifier.issn1932-5150
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/43598
dc.publisherSPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS
dc.source.beginpageArt. 043202
dc.source.endpageN/A
dc.source.issue4
dc.source.journalJOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
dc.source.numberofpages16
dc.source.volume22
dc.subject.keywordsMULTILAYER MIRRORS
dc.title

Hyper NA EUV lithography: an imaging perspective

dc.typeJournal article
dspace.entity.typePublication
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