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Integration of PVD ruthenium as a pMOS metal gate in scaled planar devices: workfunction and electrical performance on HfO2
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1909 since deposited on 2021-10-16
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Acq. date: 2026-07-19
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Statistics
Views
1909 since deposited on 2021-10-16
1last month
1last week
Acq. date: 2026-07-19
Citations