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Integration of PVD ruthenium as a pMOS metal gate in scaled planar devices: workfunction and electrical performance on HfO2
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1905 since deposited on 2021-10-16
1last month
Acq. date: 2025-12-08
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Metrics
Views
1905 since deposited on 2021-10-16
1last month
Acq. date: 2025-12-08
Citations