Publication:
Integration of PVD ruthenium as a pMOS metal gate in scaled planar devices: workfunction and electrical performance on HfO2
Date
Loading...
Journal
Abstract
Description
Metrics
Views
1903 since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations
Metrics
Views
1903 since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations