Publication:
Integration of PVD ruthenium as a pMOS metal gate in scaled planar devices: workfunction and electrical performance on HfO2
Date
Loading...
Journal
Abstract
Description
Statistics
Views
1908 since deposited on 2021-10-16
3last month
1last week
Acq. date: 2026-02-24
Citations
Statistics
Views
1908 since deposited on 2021-10-16
3last month
1last week
Acq. date: 2026-02-24
Citations