Publication:
Analysis of the two-dimensional-dopant profile in a 90 nm complementary metal-oxide-semiconductor technology using scanning spreading resistance microscopy
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1874 since deposited on 2021-10-15
1last month
Acq. date: 2025-12-08
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Metrics
Views
1874 since deposited on 2021-10-15
1last month
Acq. date: 2025-12-08
Citations