Skip to content
Institutional repository
Communities & Collections
Browse all items
Scientific publications
Open knowledge
Log In
imec Publications
Conference contributions
Measuring resist-induced contrast loss using EUV interference lithography
Publication:
Measuring resist-induced contrast loss using EUV interference lithography
Copy permalink
Date
2010
Proceedings Paper
Simple item page
Full metadata
Statistics
Loading...
Loading...
Files
20385.pdf
1.89 MB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Langner, Andreas
;
Solak, Harun H.
;
Gronheid, Roel
;
van Setten, Eelco
;
Auzelyte, Vaida
;
Ekinci, Yasin
;
van Ingen Schenau, Koen
;
Feenstra, Kees
Journal
Abstract
Description
Metrics
Views
1862
since deposited on 2021-10-18
Acq. date: 2025-12-09
Citations
Metrics
Views
1862
since deposited on 2021-10-18
Acq. date: 2025-12-09
Citations