Measuring resist-induced contrast loss using EUV interference lithography

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Author(s)

Langner, Andreas

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Solak, Harun H.

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van Setten, Eelco

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Auzelyte, Vaida

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van Ingen Schenau, Koen

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Metrics

1859 since deposited on 2021-10-18

Acq. date: 2025-10-23