Publication:

Measuring resist-induced contrast loss using EUV interference lithography

Date

2010
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorLangner, Andreas
dc.contributor.authorSolak, Harun H.
dc.contributor.authorGronheid, Roel
dc.contributor.authorvan Setten, Eelco
dc.contributor.authorAuzelyte, Vaida
dc.contributor.authorEkinci, Yasin
dc.contributor.authorvan Ingen Schenau, Koen
dc.contributor.authorFeenstra, Kees
dc.contributor.imecauthorGronheid, Roel
dc.date.accessioned2021-10-18T17:57:41Z
dc.date.available2021-10-18T17:57:41Z
dc.date.embargo9999-12-31
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17429
dc.source.beginpage76362X
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography
dc.source.conferencedate21/02/2010
dc.source.conferencelocationSan Jose, CA USA
dc.title

Measuring resist-induced contrast loss using EUV interference lithography

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
20385.pdf
Size:
1.89 MB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions