Publication:
Apparent and steady-state etch rates in thin film etching and underetching of microstructures. I: Modeling
Date
| dc.contributor.author | Van Barel, Gregory | |
| dc.contributor.author | Mertens, Luc | |
| dc.contributor.author | De Ceuninck, Ward | |
| dc.contributor.author | Witvrouw, Ann | |
| dc.contributor.imecauthor | De Ceuninck, Ward | |
| dc.date.accessioned | 2021-10-18T22:46:46Z | |
| dc.date.available | 2021-10-18T22:46:46Z | |
| dc.date.issued | 2010 | |
| dc.identifier.issn | 0960-1317 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/18143 | |
| dc.source.beginpage | 55033 | |
| dc.source.issue | 5 | |
| dc.source.journal | Journal of Micromechanics and Microengineering | |
| dc.source.volume | 20 | |
| dc.title | Apparent and steady-state etch rates in thin film etching and underetching of microstructures. I: Modeling | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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