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X-ray photoelectron spectroscopy characterisation of high-k dielectric Al2O3 and HfO2 layers deposited on SiO2/Si surface
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2125 since deposited on 2021-10-15
1last month
Acq. date: 2026-05-16
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Statistics
Views
2125 since deposited on 2021-10-15
1last month
Acq. date: 2026-05-16
Citations