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X-ray photoelectron spectroscopy characterisation of high-k dielectric Al2O3 and HfO2 layers deposited on SiO2/Si surface
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2124 since deposited on 2021-10-15
Acq. date: 2025-12-11
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Views
2124 since deposited on 2021-10-15
Acq. date: 2025-12-11
Citations