Publication:

High-Q photonic crystal nanocavities on 300 mm SOI substrate fabricated by 193 nm immersion lithography

Date

2014
Journal article
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dc.contributor.authorXie, Weiqiang
dc.contributor.authorFiers, Martin
dc.contributor.authorSelvaraja, Shankar
dc.contributor.authorBienstman, Peter
dc.contributor.authorVan Campenhout, Joris
dc.contributor.authorAbsil, Philippe
dc.contributor.authorVan Thourhout, Dries
dc.contributor.imecauthorBienstman, Peter
dc.contributor.imecauthorVan Campenhout, Joris
dc.contributor.imecauthorAbsil, Philippe
dc.contributor.imecauthorVan Thourhout, Dries
dc.contributor.orcidimecBienstman, Peter::0000-0001-6259-464X
dc.contributor.orcidimecVan Campenhout, Joris::0000-0003-0778-2669
dc.contributor.orcidimecVan Thourhout, Dries::0000-0003-0111-431X
dc.date.accessioned2021-10-22T08:31:58Z
dc.date.available2021-10-22T08:31:58Z
dc.date.embargo9999-12-31
dc.date.issued2014
dc.identifier.issn0733-8724
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24844
dc.identifier.urlhttp://ieeexplore.ieee.org/xpl/articleDetails.jsp?arnumber=6747322
dc.source.beginpage1457
dc.source.endpage1462
dc.source.issue8
dc.source.journalJournal of Lightwave Technology
dc.source.volume32
dc.title

High-Q photonic crystal nanocavities on 300 mm SOI substrate fabricated by 193 nm immersion lithography

dc.typeJournal article
dspace.entity.typePublication
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