Publication:
Determining physical properties of EpoClad negative photoresist for use in MEMS applications
Date
| dc.contributor.author | Gijsenbergh, Pieter | |
| dc.contributor.author | Wouters, Kristof | |
| dc.contributor.author | Vanstreels, Kris | |
| dc.contributor.author | Puers, Robert | |
| dc.contributor.imecauthor | Gijsenbergh, Pieter | |
| dc.contributor.imecauthor | Vanstreels, Kris | |
| dc.contributor.orcidimec | Gijsenbergh, Pieter::0000-0003-0135-6968 | |
| dc.contributor.orcidimec | Vanstreels, Kris::0000-0002-4420-0966 | |
| dc.date.accessioned | 2021-10-19T13:44:55Z | |
| dc.date.available | 2021-10-19T13:44:55Z | |
| dc.date.issued | 2011 | |
| dc.identifier.issn | 0960-1317 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/18958 | |
| dc.source.beginpage | 74001 | |
| dc.source.issue | 7 | |
| dc.source.journal | Journal of Micromechanics and Microengineering | |
| dc.source.volume | 21 | |
| dc.title | Determining physical properties of EpoClad negative photoresist for use in MEMS applications | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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