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Wafer level characterization of the sacrificial HDP oxide lateral etching by anhydrous vapor HF with ethanol vapor for SiGe MEMS structures
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1949 since deposited on 2021-10-18
Acq. date: 2025-12-15
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1949 since deposited on 2021-10-18
Acq. date: 2025-12-15
Citations