Publication:

Development of AlGaN recess etch for Emode POWER HEMTs

Date

2012
Meeting abstract
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dc.contributor.authorMannaert, Geert
dc.contributor.authorParaschiv, Vasile
dc.contributor.authorDe Jaeger, Brice
dc.contributor.authorVan Hove, Marleen
dc.contributor.authorDemand, Marc
dc.contributor.authorDecoutere, Stefaan
dc.contributor.authorBoullart, Werner
dc.contributor.imecauthorMannaert, Geert
dc.contributor.imecauthorParaschiv, Vasile
dc.contributor.imecauthorDe Jaeger, Brice
dc.contributor.imecauthorDemand, Marc
dc.contributor.imecauthorDecoutere, Stefaan
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecDe Jaeger, Brice::0000-0001-8804-7556
dc.contributor.orcidimecDecoutere, Stefaan::0000-0001-6632-6239
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.date.accessioned2021-10-20T13:10:46Z
dc.date.available2021-10-20T13:10:46Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21092
dc.source.conferencePlasma Etch and Strip in Microelectronics - PESM
dc.source.conferencedate15/03/2012
dc.source.conferencelocationGrenoble France
dc.title

Development of AlGaN recess etch for Emode POWER HEMTs

dc.typeMeeting abstract
dspace.entity.typePublication
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