Skip to content
Institutional repository
Communities & Collections
Browse
Site
Log In
imec Publications
Conference contributions
Etch process development for FLARE(tm) for dual damascene architecture using a N2/O2 plasma
Publication:
Etch process development for FLARE(tm) for dual damascene architecture using a N2/O2 plasma
Date
1999
Proceedings Paper
Simple item page
Full metadata
Statistics
Loading...
Loading...
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Thompson, Heike
;
Vanhaelemeersch, Serge
;
Maex, Karen
;
Van Ammel, Annemie
;
Beyer, Gerald
;
Coenegrachts, Bart
;
Vervoort, Iwan
;
Waeterloos, Joost
;
Struyf, Herbert
;
Palmans, Roger
;
Forester, Lynn
Journal
Abstract
Description
Metrics
Views
1905
since deposited on 2021-10-14
Acq. date: 2025-10-23
Citations
Metrics
Views
1905
since deposited on 2021-10-14
Acq. date: 2025-10-23
Citations