Publication:
Hard Mask Strategies in Nanoscale Patterning of Mg-Based Oxide Semiconductors: Implications for Advanced Device Architectures
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| cris.virtual.orcid | 0000-0001-8052-7774 | |
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| cris.virtualsource.orcid | 2e1a4044-2f8b-47ea-8612-2045517769f9 | |
| dc.contributor.author | Ghorbani, Leila | |
| dc.contributor.author | Pavel, Alexandru | |
| dc.contributor.author | Dekkers, Harold | |
| dc.contributor.author | De Gendt, Stefan | |
| dc.contributor.author | Kundu, Shreya | |
| dc.contributor.orcidext | 0000-0003-1167-1996 | |
| dc.contributor.orcidext | 0000-0003-4778-5709 | |
| dc.contributor.orcidext | 0000-0003-3775-3578 | |
| dc.contributor.orcidext | 0000-0001-8052-7774 | |
| dc.date.accessioned | 2026-05-06T07:56:13Z | |
| dc.date.available | 2026-05-06T07:56:13Z | |
| dc.date.createdwos | 2025-12-18 | |
| dc.date.issued | 2025 | |
| dc.description.wosFundingText | We acknowledge the support from IMEC's industrial affiliation program (IIAP). We also thank IMEC's pilot line team and MCA team for their assistance with the characterization processes. | |
| dc.identifier.doi | 10.1021/acsanm.5c04430 | |
| dc.identifier.eissn | 2574-0970 | |
| dc.identifier.issn | 2574-0970 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/59346 | |
| dc.language.iso | eng | |
| dc.provenance.editstepuser | greet.vanhoof@imec.be | |
| dc.publisher | AMER CHEMICAL SOC | |
| dc.source.beginpage | 24046 | |
| dc.source.endpage | 24056 | |
| dc.source.issue | 50 | |
| dc.source.journal | ACS APPLIED NANO MATERIALS | |
| dc.source.numberofpages | 11 | |
| dc.source.volume | 8 | |
| dc.subject.keywords | ETCHING CHARACTERISTICS | |
| dc.title | Hard Mask Strategies in Nanoscale Patterning of Mg-Based Oxide Semiconductors: Implications for Advanced Device Architectures | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| imec.internal.crawledAt | 2025-12-12 | |
| imec.internal.source | crawler | |
| imec.internal.wosCreatedAt | 2026-04-07 | |
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