Publication:

Challenges for spacer and source/drain cavity patterning in CFET devices

 
dc.contributor.authorMannaert, Geert
dc.contributor.authorMertens, Hans
dc.contributor.authorHosseini, Maryam
dc.contributor.authorDemuynck, Steven
dc.contributor.authorNguyen, Vy Thi Hoang
dc.contributor.authorChan, BT
dc.contributor.authorLazzarino, Frederic
dc.contributor.imecauthorMannaert, Geert
dc.contributor.imecauthorMertens, Hans
dc.contributor.imecauthorHosseini, Maryam
dc.contributor.imecauthorDemuynck, Steven
dc.contributor.imecauthorNguyen, Vy Thi Hoang
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.orcidimecMannaert, Geert::0009-0003-1267-5355
dc.contributor.orcidimecMertens, Hans::0000-0002-3392-6892
dc.contributor.orcidimecHosseini, Maryam::0000-0002-0210-4095
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.date.accessioned2025-02-10T14:04:56Z
dc.date.available2023-06-26T07:30:24Z
dc.date.available2025-02-10T14:04:56Z
dc.date.embargo2023-05-01
dc.date.issued2023-05-16
dc.identifier.doihttp://dx.doi.org/10.1117/12.2658073
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/42094
dc.publisherSPIE
dc.source.beginpageArt. 1249908
dc.source.conferenceSPIE Advanced Lithography + Patterning
dc.source.conferencedate26 February – 2 March 2023
dc.source.conferencelocationSan Jose, CA
dc.source.endpageN/A
dc.source.journalProceedings of SPIE; Vol. 12499
dc.source.numberofpages10
dc.subject.disciplineElectrical & electronic engineering
dc.title

Challenges for spacer and source/drain cavity patterning in CFET devices

dc.typeProceedings paper
dspace.entity.typePublication
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