Publication:

SOI n- and pMuGFET devices with different TiN metal gate tThickness under influence of sidewall crystal orientation

Date

Loading...
Thumbnail Image

Abstract

Description

Statistics

Views

1882 since deposited on 2021-10-19
Acq. date: 2026-03-17

Citations

Statistics

Views

1882 since deposited on 2021-10-19
Acq. date: 2026-03-17

Citations