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Cu seeding using electroless deposition on Ru liner for high aspect ratio through-Si vias
Publication:
Cu seeding using electroless deposition on Ru liner for high aspect ratio through-Si vias
Date
2014
Proceedings Paper
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30496.pdf
1.06 MB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Inoue, Fumihiro
;
Philipsen, Harold
;
van der Veen, Marleen
;
Vandersmissen, Kevin
;
Van Huylenbroeck, Stefaan
;
Struyf, Herbert
;
Tanaka, Tetsu
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1967
since deposited on 2021-10-22
Acq. date: 2025-11-01
Citations
Metrics
Views
1967
since deposited on 2021-10-22
Acq. date: 2025-11-01
Citations