Publication:
The use of ion implantation of strained silicon on SiO2 for nanoelectronic devices
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1877 since deposited on 2021-10-16
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Acq. date: 2026-03-16
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Statistics
Views
1877 since deposited on 2021-10-16
1last month
1last week
Acq. date: 2026-03-16
Citations