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The use of ion implantation of strained silicon on SiO2 for nanoelectronic devices
Publication:
The use of ion implantation of strained silicon on SiO2 for nanoelectronic devices
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Date
2005
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Mantl, S.
;
Buca, Dan
;
Hollander, Bernd
;
Trinkaus, Helmut
;
Hueging, Norbert
;
Luysberg, Martina
;
Lenk, Steffi
;
Loo, Roger
;
Caymax, Matty
;
Shaefer, Herbert
;
Reiche, Manfred
;
Radu, Ionut
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1876
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Acq. date: 2025-12-10
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Metrics
Views
1876
since deposited on 2021-10-16
1
last month
Acq. date: 2025-12-10
Citations