Publication:
Area-Selective Atomic Layer Deposition of TiN Using Trimethoxy(octadecyl)silane as a Passivation Layer
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1935 since deposited on 2021-11-02
Acq. date: 2025-10-25
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Views
1935 since deposited on 2021-11-02
Acq. date: 2025-10-25
Citations