Publication:
Area-Selective Atomic Layer Deposition of TiN Using Trimethoxy(octadecyl)silane as a Passivation Layer
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1945 since deposited on 2021-11-02
3last month
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Acq. date: 2026-01-08
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Views
1945 since deposited on 2021-11-02
3last month
2last week
Acq. date: 2026-01-08
Citations