Exploration of a low-temperature PEALD technology to trim and smooth 193i photoresist

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Author(s)

Lazzarino, Frederic

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De Roest, David

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Decoster, Stefan

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Rutigliani, Vito

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Constantoudis, Vassilios

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Van Elshocht, Sven

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2012 since deposited on 2021-10-24

Acq. date: 2025-10-24